Model: NanoPVD Model S10A
Manufacturer: Moorfield
Area: Clean Room

Instrument model:

Moorfield NanoPVD

Technology Description:

Magnetron sputtering is a technique which can be used for thin film deposition with a wide range of materials – in principle any solid metal or alloy and a variety of compounds. Sputtering is the removal of atomized material from a solid due to energetic bombardment of its surface layers by ions or neutral particles. The NanoPVD offers co-deposition of two targets, and multilayer films without breaking vacuum. The NanoPVD is intended for processes which are "dirty", i.e. all processes which are not epitaxial or involve materials which are not allowed in the Semicore, Moorfield MiniLab or Flextura.

Technical Information:

Sources: 1 DC max power 850W and 1 RF max power 150W.

Target size: 3 x 2”

Substrate size: 4” Single wafer chamber, but smaller samples can be mounted on the sample holder.

Substrate heating: 20 ºC – 600 ºC

Gas: Ar, N2 and O2

Materials: wide range of materials allowed, including metal oxides, metal nitrides and metal coatings. 


Vegard Skiftestad Olsen

Lab Manager

UiO MiNaLab

Lab manager responsible for the operation of UiO MiNaLab, including lab management and procurement of new instruments. In addition I am also one of the main responsible for the thin film deposition by sputtering, as well as the XRD and Hall characterization methods.

+47 991 59 872