Model: MLA150
Manufacturer: Heidelberg
Area: Lithography & Wet Etch

The MLA150 Maskless aligner is a direct laser write tool. Two laser sources 405nm and 375nm. So all NanoLab photoresists are compatible with the system. Capable of exposing substrates from 5mm X 5mm up to full 6” wafers or masks. Substrate thickness must be between 0.1 and 6mm. The system has a topside alignment accuracy of 500nm and backside of 1µm. Minimum line width is 1µm. The system accepts GDSII, CIF, Gerber and DXF formats.

Contact:

Mark Chiappa

Senior Engineer

NTNU NanoLab

Responsible for ultra violet lithography, electron beam lithography at NTNU NanoLab.

‭+47 91897617‬
mark.chiappa@ntnu.no