Model: SPTS Rapier
Manufacturer: SPTS Technologies Ltd
Area: Cleanroom

Tool description

A stand-alone, single wafer etcher with one reactor and cassette to cassette automatic wafer handling. The Rapier process module is equipped with a patented design of dual high- density inductively coupled plasma (ICP) sources with independently controlled primary and secondary decoupled plasma zones, with independent dual gas inlets. This enables excellent uniformity of etch profiles and control of structure tilt across the wafer. The Rapier is purpose built for deep reactive ion etching (DRIE) and high aspect ratio etching of silicon using the Bosch (switched) process. In addition, it is also possible to perform (continuous) RIE etch processes such as etching of thin films of SiO2, Si3N4, polySi and organic materials.

Technical information

  • Materials allowed: 150 mm Si substrates, with thin films of SiO2, Si3N4, Al, polySi and photoresist.
  • Substrate thickness range: Minimum 300 µm, Maximum 2 mm.     
  • Substrate clamping type: Electrostatic.
  • Optional wafer edge protection: Non-contact wafer edge protection (WEP) rings with either 4 mm or 2 mm wafer edge overlap can be used with wafers up to 1mm thick.
  • Wafer edge exclusion zone: 8 mm without WEP, 10 mm with WEP.
  • Plasma sources: Dual ICP plasma sources, with independent high frequency RF generators (13.56 MHz) with 3kW maximum usable power.
  • Substrate bias options: High frequency RF generator (13.56 MHz) with 1.2 kW maximum usable power or Low frequency RF generator (375 kHz) with 300 W maximum usable power. Pulsing of bias power is possible for both.
  • Process gases available: SF6 , C4F8 , O2 , Ar , CF4
  • Process pressure: Up to 20 Pa
  • Substrate holder temperature range: -10 °C to +40 °C

Contact persons

Process responsible: Anand Summanwar

Senior Process Scientist

Dept. of Smart Sensors & Microsystems

SINTEF Digital

Email: Anand.Summanwar@sintef.no

Tel: +47 9823 0490

Service responsible: Tri Huu Nguyen

Senior Engineer

Dept. of Smart Sensors & Microsystems

SINTEF Digital

Email: TriHuu.Nguyen@sintef.no

Tel: +47 9162 2832