Model: GSL1100X
Manufacturer: GSL1100X
Area: MiNaLab Clean Room

This furnace is dedicated treatment of metallized Si samples (Contact tool responsible if you need it for anything else)

  • Max. Temperature: 1100 °C  (< 2 hour)
  • Continuous working temperature: 1000 °C
  • Max. Heating Rate: 20°C /min


Halvor Dolva

Head Engineer

UiO MiNaLab

Responsible engineer for dry etching, and thin film deposition with PECVD. Tool-responsible on multiple tools. Maintenance, purchasing, safety

+47 924 92 053