Model: uPG501
Manufacturer: Heidelberg instruments
Area: Lithography-room

Technology Description:

The μPG 501 is a micro pattern generator for direct writing applications. The system can be used for prototyping MEMS, Bio-MEMS, integrated optics, and microfluidics (a prime example is Lab-on-a-Chip devices), or any other application that requires high precision, high-resolution microstructures. The μPG 501 is equipped with a 10W light-emitting diode operating at 390 nm, a 600×800 pixel digital micro-mirror device, and a motorized stage to expose patterns on resist-coated substrates. The μPG 501 can expose standard positive and negative photoresists as well as UV-resists. The Heidelberg Software is compatible with GDSII, DXF, GERBER, CIF, BMP, and STL files.

Technical Information:

Maximum substrate size: 152.5 × 152.5 mm2 (6 × 6 in.2).

Minimum substrate size: 10 × 10 mm2.

Maximum writing area: 125 × 125 mm2.

Substrate thickness: 0 – 6 mm.

Substrate flatness: < ± 20 µm.

Writing Performance:

Minimum feature size: 1 μm.

CD uniformity (3σ): 200 nm.

Write speed: 50 mm²/min.

Address grid: 50 nm.

Line edge roughness (3σ): 100 nm.

Alignment accuracy (3σ): 200 nm.

Sample Preparation Equipment:

Laurell Spin Coater. The photoresist film coating Laurell WS-MZ spinner used is a programmable spinner operating at 100-1200 RPM. A hotplate is used for photoresist baking. A separate training session is required before new users are allowed to work independently with the photoresist coater.


Viktor Bobal

Senior Engineer

UiO MiNaLab

Responsible for the ion beam techniques as UiO MiNaLab, as well as the thermal processes. In addition tool responsible on multiple tools.

+47 90713892