Model: CEE 100
Manufacturer: -
Area: MiNaLab Lithography-room

Material Class:

  

Technology Description:

 

 Spin Coating is the standard method for applying photoresist coating to produce a thin uniform layer of photoresist on the wafer surface.

Technical Information:

 Type: CEE 100

 

Contact:

Viktor Bobal

Senior Engineer

UiO MiNaLab

Responsible for the ion beam techniques as UiO MiNaLab, as well as the thermal processes. In addition tool responsible on multiple tools.

+47 90713892
v.m.bobal@fys.uio.no