Model: AS-Micro
Manufacturer: AnnealSys
Area: MiNaLab Clean Room

Material Class:

 Si, ZnO?

Technology Description:

 

 Annealsys Rapid Thermal Annealing furnaces use infrared lamp heating and can be used for various applications for silicon, compound semiconductor, photovoltaic, MEMS and other materials. Typical processes include implantation annealing, contact annealing, crystallization and densification. Rapid thermal oxidation and nitridation are also commonly performed.

Technical Information:

 Ramp rate 50deg/s

  • 2” Single wafer chamber for Si and ZnO

 

Contact:

Viktor Bobal

Senior Engineer

UiO MiNaLab

Responsible for the ion beam techniques as UiO MiNaLab, as well as the thermal processes. In addition tool responsible on multiple tools.

+47 90713892
v.m.bobal@fys.uio.no