Model: MLA100
Manufacturer: Heidelberg
Area: Student Lab

The MLA100 Maskless aligner is a direct write tool. It’s the little brother to our MLA 150. The illumination is provided by a 10W 365nm UV LED so all NanoLab photoresists are compatible with the system. Capable of exposing substrates from 5mm X 5mm up to full 5” wafers or masks. Substrate thickness must be between 0.1 and 5mm. The system has a topside alignment accuracy of 1µm.   Minimum line width is 1µm. The system accepts GDSII, CIF, BMP and DXF formats.  It’s also capable greyscale lithography.


Mark Chiappa

Senior Engineer

NTNU NanoLab

Responsible for ultra violet lithography, electron beam lithography at NTNU NanoLab.

‭+47 91897617‬