Mask Aligner – Karl Suss MA56

Mask Aligner donated from NTNU.

Nearly new (1989) !

The Karl Suss MA 56 is a mask alignment and exposure system which offers unsurpassed, highly economical mass production capabilities for cassette to cassette handling of wafers up to 4″ wafers and 5″ masks, although smaller wafers and chips may be mounted to a 4″ carrier wafer and processed.  The light source is a 350 W mercury arc lamp with 365 nm wavelength.  The vacuum contact mode is available. 
The microscope has dual alignment objectives and split-field viewing.  The mask and microscope have motorized motion in x and y, and they may be moved together or independently over the stationary wafer.
 Possible contact modes:

• Soft contact

Contact:

Zekija Ramic

Chemist

USN MST-Lab

Chemical and biological methods
Dry etch
Lithography
Thermal processes
Thin film deposition

+47 41228133

zekija.ramic@usn.no