Model: PVD 200
Manufacturer: K.J. Lesker
Area: Thin Film & Dry Etch

The Lesker E-beam evaporator is the newest evaporator in NanoLab. It is a tool dedicated for metal evaporation. The machine is fully automated and therefore very user friendly. Sample loading is easy and pump down time is fast.

Specifications:

  • 8 x 20 cc material pockets
  • Sample size up to 6 inch in diameter
  • Available targets: Ti, Au, Al, Cu, Pt, Cr, NiFe (other metals on request)
  • Deposition rate: 1 – 5Å/s (depending on material)
  • Film thickness: 0,5 nm – few hundred nm (depending on material)

Contact:

Martijn de Roosz

Senior Engineer

NTNU NanoLab

Responsible for Thin Film deposition and Dry Etch section at NTNU NanoLab.

+47 46932581
martijn.de.roosz@ntnu.no